Bhattacharyya, A S and Das, G C and Mukherjee, S and Mishra, Suman K (2009) Effect of radio frequency and direct current modes of deposition on protective metallurgical hard silicon carbon nitride coatings by magnetron sputtering. Vacuum, 83 (12). pp. 1464-1469.
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Abstract
Siliconcarbonitride (Si–C–N) coatings were deposited on silicon (100) by magnetron sputtering using radio frequency alternating current and direct current. The mechanical performance of the coatings in the two modes was compared through static indentation and scratch test in both microlevel and nanolevel. A structure–property correlation was attempted to establish mechanical behavior, microstructure and bond present in the film. Studies showed RF films to be mechanically tougher and having higher scratch resistance compared to the DC films.
Item Type: | Article |
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Official URL/DOI: | http://dx.doi.org/10.1016/j.vacuum.2009.06.051 |
Uncontrolled Keywords: | Si–C–N coatings; RF–DC magnetron sputtering |
Divisions: | Material Science and Technology |
ID Code: | 667 |
Deposited By: | Sahu A K |
Deposited On: | 02 Jun 2010 12:16 |
Last Modified: | 14 Dec 2011 10:42 |
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