Deposition of crystalline C–N film by arc evaporation process

Mishra, Suman K and Pathak, L C (2005) Deposition of crystalline C–N film by arc evaporation process. Materials Letters, 59 (27). pp. 3481-3484.

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Crystalline carbon nitride thin films were deposited by Arc evaporation process. The room temperature deposited films showed amorphous and polycrystalline phases whereas, the films were crystalline, when deposited at 300 °C. These films were nano-crystalline and had grain sizes varying from 5 to 30 nm depending on the deposition condition. The average C : N at.% ratio for films deposited at 300 °C substrate temperature was found as C : N :: 39.37 : 59.87. The microhardness of the deposited films were in the range of 2200Hv.015 to 1800Hv.015.

Item Type:Article
Official URL/DOI:
Uncontrolled Keywords:Carbon nitride; Arc evaporation; Hard coatings
Divisions:Material Science and Technology
ID Code:579
Deposited By:Sahu A K
Deposited On:01 Jun 2010 14:51
Last Modified:25 Jan 2012 10:13
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