XPS Studies on Nanocomposite Si-C-N Coatings Deposited by Magnetron Sputtering

Mishra, Suman K and Bhattacharyya, A S and Rupa, P K P and Pathak, L C (2012) XPS Studies on Nanocomposite Si-C-N Coatings Deposited by Magnetron Sputtering. Nanoscience and nanotechnology letters, 4 (3). pp. 352-357.

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A systematic X-ray photoelectron spectroscopy (XPS) investigation on silicon-carbon-nitride (Si-C-N) nano-composite thin films deposited at varying deposition parameters has been carried out. X-ray photoelectron spectroscopy analyses revealed the presence of C-N and Si-N bonds in the harder films. The hardness of the film was found to vary within the range similar to 2400 to 3300 Hv. The harder film had higher C-N/Si-N intensity ratio confirming that C-N bond formations contribute in increasing hardness value.

Item Type:Article
Official URL/DOI:http://dx.doi.org/10.1166/nnl.2012.1320
Uncontrolled Keywords:Silicon Carbon Nitride; Sputtering; Hardness; X-ray Photoelectron Spectroscopy (XPS)
Divisions:Corrosion and Surface Engineering
Material Science and Technology
ID Code:5632
Deposited By:Dr. A K Sahu
Deposited On:29 Jun 2012 10:21
Last Modified:29 Jun 2012 10:21
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