Rupa, P K P and Chakrborty, P C and Purnapu, Karuna and Mishra, Suman K (2011) Nanoindentation Studies of Hard Nanocomposite Ti-B-N Thin films. AIP Conference Proceedings, 1393 (3.596 (SCI)). pp. 239-240.
Full text not available from this repository.
Abstract
Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB2) target in different Ar-N2 gas mixtures. The influence of N2Ar ratio on the microstructure and mechanical properties of the microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.
| Item Type: | Article |
|---|---|
| Official URL/DOI: | http://adsabs.harvard.edu//abs/2011AIPC.1393..239R |
| Uncontrolled Keywords: | sputtering; phase diagrams; X-ray diffraction; hardness |
| Divisions: | Material Science and Technology |
| ID Code: | 5023 |
| Deposited By: | Sahu A K |
| Deposited On: | 19 Apr 2012 17:41 |
| Last Modified: | 18 Dec 2012 14:09 |
| Related URLs: |
Repository Staff Only: item control page
