Nanoindentation Studies of Hard Nanocomposite Ti-B-N Thin films

Rupa, P K P and Chakrborty, P C and Purnapu, Karuna and Mishra, Suman K (2011) Nanoindentation Studies of Hard Nanocomposite Ti-B-N Thin films. AIP Conference Proceedings, 1393 (3.596 (SCI)). pp. 239-240.

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Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB2) target in different Ar-N2 gas mixtures. The influence of N2Ar ratio on the microstructure and mechanical properties of the microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.

Item Type:Article
Official URL/DOI:
Uncontrolled Keywords:sputtering; phase diagrams; X-ray diffraction; hardness
Divisions:Material Science and Technology
ID Code:5023
Deposited By:Sahu A K
Deposited On:19 Apr 2012 17:41
Last Modified:18 Dec 2012 14:09
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