Mishra, Suman K and Bhattacharyya, A S and Rupa, P K P and Pathak, L C (2013) XPS Studies on Nanocomposite SiCN Coatings Deposited by Magnetron Sputtering. Nanoscience and Nanotechnology Letters, 4 (3). pp. 352-357.
Full text not available from this repository. (Request a copy)Abstract
A systematic X-ray photoelectron spectroscopy (XPS) investigation on silicon-carbon-nitride (Si-CN) nano-composite thin films deposited at varying deposition parameters has been carried out. X-ray photoelectron spectroscopy analyses revealed the presence of CN and Si-N bonds in the harder films. The hardness of the film was found to vary within the range∼ 2400 to 3300 Hv. The harder film had higher CN/Si-N intensity ratio confirming that
CN bond formations contribute in increasing hardness value.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Nanocomposites, silicon-carbon-nitride, Magnetron Sputtering |
| Subjects: | Nanoscience and Nanotechnology |
| Divisions: | Material Science and Technology |
| Depositing User: | Dr. A K Sahu |
| Date Deposited: | 27 Jul 2012 18:36 |
| Last Modified: | 27 Jul 2012 18:36 |
| URI: | http://eprints.nmlindia.org/id/eprint/5854 |
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