Mishra, Suman K and Bhattacharyya, A S and Rupa, P K P and Pathak, L C (2012) XPS Studies on Nanocomposite Si-C-N Coatings Deposited by Magnetron Sputtering. Nanoscience and nanotechnology letters, 4 (3). pp. 352-357.
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Abstract
A systematic X-ray photoelectron spectroscopy (XPS) investigation on silicon-carbon-nitride (Si-C-N) nano-composite thin films deposited at varying deposition parameters has been carried out. X-ray photoelectron spectroscopy analyses revealed the presence of C-N and Si-N bonds in the harder films. The hardness of the film was found to vary within the range similar to 2400 to 3300 Hv. The harder film had higher C-N/Si-N intensity ratio confirming that C-N bond formations contribute in increasing hardness value.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Silicon Carbon Nitride; Sputtering; Hardness; X-ray Photoelectron Spectroscopy (XPS) |
| Subjects: | Materials Science Nanoscience and Nanotechnology |
| Divisions: | Corrosion and Surface Engineering Material Science and Technology |
| Depositing User: | Dr. A K Sahu |
| Date Deposited: | 29 Jun 2012 04:51 |
| Last Modified: | 03 Sep 2026 06:57 |
| URI: | http://eprints.nmlindia.org/id/eprint/5632 |
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