Yadav, M and Kumar, Uttam and De, A K and Sinha, I (2024) Neutral pH Fenton and photo-Fenton activity of Mo-doped iron-pyrite particles. Physical Chemistry Chemical Physics .
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Abstract
Low H2O2 utilization efficiency for hydroxyl radical generation, acidic pH, and recyclability are critical limitations of heterogeneous Fenton and photo-Fenton catalysts. The present research shows that the optimum Mo doping of FeS2 particles can largely alleviate these catalysis constraints. A solvothermal protocol was followed to prepare polyvinyl pyrrolidone (PVP) stabilized FeS2 and Mo-doped FeS2 particles. XRD observations showed that Mo doping increases the lattice parameters of FeS2. The band gap of the Mo-doped FeS2 particles decreased to 1.58 eV from the 2.24 eV value exhibited by pure FeS2 particles. Structural and electronic structure DFT calculations support these results. The Fenton and photo-Fenton p-nitrophenol (PNP) degradation at neutral pH on PVP-stabilized Mo-doped FeS2 and FeS2 particles were examined. The photo-Fenton results were substantially better than under Fenton conditions. The best PNP degradation photo-Fenton turnover frequency (TOF) recorded was 254.50 mu mol g-1 min-1 on the PVP stabilized 4% Mo-doped FeS2 sample. The Mo-doped FeS2 catalysts were stable under photo-Fenton recycling, and the H2O2 (1.66 mM) required for these reactions was significantly lower than most reports (30-6000 mM). Given the economic importance of the latter in Fenton/photo-Fenton reactions, H2O2 normalized turnover frequency (13.85 and 153.31 mg-1 min-1 L for Fenton and photo-Fenton) values were used to evaluate catalytic activities. Mo-doping enhances FeS2 photo-Fenton activity and recyclability at neutral pH by effective Fe3+ to Fe2+ conversion.
Item Type: | Article |
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Official URL/DOI: | https://10.1039/d4cp00793j |
Uncontrolled Keywords: | Band-gap, degradation, oxidation, FES2, decomposition, nitrophenol, peroxide, XPS |
Divisions: | Material Science and Technology |
ID Code: | 9624 |
Deposited By: | HOD KRIT |
Deposited On: | 03 Sep 2024 17:36 |
Last Modified: | 03 Sep 2024 17:36 |
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