Badhirappan, G P and Nallasivam, V and Varadarajan, M and Leobeemrao, V P and Bose , S and Venugopal, E and Rajendran, S and Angleo, P C (2018) Phase Competition Induced Bio-Electrochemical Resistance and Bio-Compatibility Effect in Nanocrystalline Zr-x-Cu100-x Thin Films. Journal of nano science and nanotechnology , 18(7) (IF-1.483). pp. 4534-4543.
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Abstract
Nano-crystalline Zr-x-Cu100-x (x = 20-100 at.%) thin films with thickness ranging from 50 to 185 nm were deposited by magnetron co-sputtering with individual Zr and Cu targets. The as-sputtered thin films were characterized by Field Emission Scanning Electron Microscope (FE-SEM), Atomic Force Microscopy (AFM) and Glancing Incidence X-ray Diffraction (GIXRD) for structural and morphological properties. The crystallite size was found to decrease from 57 nm to 37 nm upon increasing the Zr content from 20 to 30 at.% with slight increase in the lattice strain from 0.17 to 0.33%. Further, increase in Zr content to 40 at.% leads to increase in the crystallite size to 57 nm due to stabilization of C10Zr7 phase along with the presence of nanocrystalline Cu-Zr phase. A bimodal distribution of grain size was observed from FE-SEM micrograph was attributed to the highest surface roughness in Zr30Cu70 thin films comprised of Cu10Zr7, Cu9Zr2, Cu-Zr intermetallic phases. In-vitro electro-chemical behaviors of nano-crystalline Zr-x-Cu100-x thin films in simulated body fluid (SBF) were investigated using potentiodynamic polarization studies. Electrochemical impedance spectroscopy (EIS) data fitting by equivalent electrical circuit fit model suggests that inner bulk layer contributes to high bio-corrosion resistance in Zr-x-Cu100-x thin films with increase in Zr content. The results of cyto-compatibility assay suggested that Zr-Cu thin film did not introduce cytotoxicity to osteoblast cells, indicating its suitability as a bio-coating for minimally invasive medical devices.
Item Type: | Article |
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Official URL/DOI: | http:// 0.1166/jnn.2018.15270 |
Uncontrolled Keywords: | Nanocrystalline; Thin Film; Sputtering; Electrochemical Corrosion |
Divisions: | Material Science and Technology |
ID Code: | 7804 |
Deposited By: | Sahu A K |
Deposited On: | 03 May 2018 17:29 |
Last Modified: | 13 Jul 2018 14:26 |
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