Effect of radio frequency and direct current modes of deposition on protective metallurgical hard silicon carbon nitride coatings by magnetron sputtering

Abstract

Siliconcarbonitride (Si–C–N) coatings were deposited on silicon (100) by magnetron sputtering using radio frequency alternating current and direct current. The mechanical performance of the coatings in the two modes was compared through static indentation and scratch test in both microlevel and nanolevel. A structure–property correlation was attempted to establish mechanical behavior, microstructure and bond present in the film. Studies showed RF films to be mechanically tougher and having higher scratch resistance compared to the DC films.