Mishra, Suman K and Bhattacharyya, A S and Rupa, P K P and Pathak, L C (2013) XPS Studies on Nanocomposite SiCN Coatings Deposited by Magnetron Sputtering. Nanoscience and Nanotechnology Letters, 4 (3). pp. 352-357.
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A systematic X-ray photoelectron spectroscopy (XPS) investigation on silicon-carbon-nitride (Si-CN) nano-composite thin films deposited at varying deposition parameters has been carried out. X-ray photoelectron spectroscopy analyses revealed the presence of CN and Si-N bonds in the harder films. The hardness of the film was found to vary within the range∼ 2400 to 3300 Hv. The harder film had higher CN/Si-N intensity ratio confirming that CN bond formations contribute in increasing hardness value.
|Uncontrolled Keywords:||Nanocomposites, silicon-carbon-nitride, Magnetron Sputtering|
|Divisions:||Material Science and Technology|
|Deposited By:||Dr. A K Sahu|
|Deposited On:||28 Jul 2012 00:06|
|Last Modified:||28 Jul 2012 00:06|
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