Rupa, P K P and Chakrborty, P C and Purnapu, Karuna and Mishra, Suman K (2011) Nanoindentation Studies of Hard Nanocomposite Ti-B-N Thin films. AIP Conference Proceedings, 1393 (3.596 (SCI)). pp. 239-240.
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Official URL/DOI: http://adsabs.harvard.edu//abs/2011AIPC.1393..239R
Abstract
Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB2) target in different Ar-N2 gas mixtures. The influence of N2Ar ratio on the microstructure and mechanical properties of the microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | sputtering; phase diagrams; X-ray diffraction; hardness |
| Subjects: | Materials Science |
| Divisions: | Material Science and Technology |
| Depositing User: | Users 5 not found. |
| Date Deposited: | 19 Apr 2012 12:11 |
| Last Modified: | 18 Dec 2012 08:39 |
| URI: | http://eprints.nmlindia.org/id/eprint/5023 |
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